Ultra-Fast Imaging: The 200 Nanosecond Breakthrough

Speed can change everything in manufacturing inspection. While conventional SEMs produce electron “glare,” risk damaging specimens, and require obscuring conductive coatings, AirSEM takes a different approach – capturing high-magnification images in just 200 nanoseconds, in open air, with zero sample preparation.

This advancement transforms quality control for essential glass components used in LCDs, solar cells, touchscreens, and semiconductor packaging. Glass substrates serve as the foundation for manufacturing various electronic devices, making their flawless production critical for end-product quality.

Traditional inspection methods face three key problems when examining glass: 

• electron buildup causes distracting “glare,” 
• the electron beam can damage the specimen 
• conductive coating requirements mask finer surface features while slowing the process.

By achieving high-magnification imaging in mere nanoseconds without preparation requirements, AirSEM reduces damage risk from both conductive coating and electron beam exposure. This capability allows manufacturers to inspect glass substrates in their natural state while avoiding both glare and beam damage.

The practical impact is significant: manufacturers can now detect defects earlier in production processes and transition from limited statistical sampling to more complete inspection protocols—all while preserving the original condition of these sensitive materials. This represents a true revolution in quality control for critical glass components.